Reorientation of magnetic anisotropy in obliquely sputtered metallic thin films
نویسندگان
چکیده
Reorientation in the magnetic anisotropy as a function of film thickness has been observed in Co-Ni and Co thin films, obliquely sputtered on a polyethylene terephthalate substrate at a large incidence angle ~70°!. This effect is a consequence of the low magnetocrystalline anisotropy of the films ~fcc structure of Co! and changes in microstructure from nuclei to columns according to the thickness. The critical thickness for this transition was estimated to be 30 nm for Co-Ni.
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